Research assistant Aparna Muraleedharan represented the Laboratory of Chemical Process Engineering this year at the 34th annual European Symposium on Computer Aided Process Engineering (ESCAPE) held on June 2–6 in Florence, Italy.
Photo: Aparna Muraleedharan
Muraleedharan presented her work, Benchmarking Deep Anomaly Detection on Real Process Data of a Continuous Distillation Process, as part of the session on Digitalization and Machine Learning.
This year’s symposium was a joint event with the 15th International Symposium on Process Systems Engineering (PSE).